Solid-state photolithography (SSP) enables the capabilities of one of the most important tools in nano- and microfabrication, the mask aligner, to be performed on the benchtop. SSP can create patterns over a wide range of different length scales (down to several hundred nanometers) and over macroscale areas at a fraction of the cost of current instruments. The design of the SSP system alleviates the need for dedicated power supplies, vacuum lines, and cooling systems, and thus makes SSP a compact and portable photolithography option. The cover image is a close-up of the ultraviolet light-emitting diode (LED) array that is used as the solid-state light source for SSP.
Photolithography on the Benchtop
by Teri Odom | Feb 15, 2011 | Featured Research